AIBO DRY ASHER SERIES
Acmewin offers Aibo Dry Asher platforms for compact legacy equipment upgrades, multi-application 4-inch to 8-inch processing, and 12-inch conceptual system development.
Series Overview
The Aibo Dry Asher Series covers a range of semiconductor plasma-processing requirements, from compact equipment upgrades to multi-chamber production platforms and 12-inch conceptual systems.
Aibo I
Compact platform and legacy equipment upgrade solution.
Aibo II
Multi-application 4-inch to 8-inch dry asher platform.
Aibo III
12-inch conceptual triple-process-module platform.
Aibo Dry Asher Platforms
Each Aibo platform is positioned for a different equipment and process requirement. Final configuration should be reviewed according to wafer size, process application, throughput target and integration needs.
Aibo I Dry Asher
Compact dry asher platform and upgrade solution for selected legacy semiconductor equipment applications.
- Compact platform
- 4-inch to 8-inch configuration review
- RF / plasma upgrade options
- Windows-based control upgrade
- Equipment lifecycle support
Aibo II Dry Asher
Multi-application dry asher platform supporting strip, de-scum, lite etch and plasma clean applications.
- 4", 5", 6", 8" wafer support
- Single / Dual / Triple Chamber
- ICP 13.56 MHz
- Maximum RF Power: Up to 2000 W
- Temperature: 20-260 C
Aibo III Dry Asher
12-inch conceptual dry asher platform with EFEM, FOUP, Load Lock, Transfer Chamber and triple process modules.
- 12-inch wafer concept
- Triple process module concept
- EFEM / FOUP
- Load Lock / Transfer Chamber
- ICP 13.56 MHz
Conceptual Design / 3D Layout Rendering
View ProductPlatform Comparison
This comparison is intended as a public platform guide. Detailed configuration and process performance require project-specific review.
| Item | Aibo I | Aibo II | Aibo III |
|---|---|---|---|
| Platform Position | Compact / Upgrade Platform | Multi-application Production Platform | 12-inch Concept Platform |
| Wafer Size | 4-inch to 8-inch configuration review | 4″, 5″, 6″, 8″ | 12-inch concept |
| Chamber Configuration | Configuration review by project | Single / Dual / Triple | Triple Process Module Concept |
| Primary Applications | Strip / selected legacy applications | Strip / De-scum / Lite Etch / Plasma Clean | 12-inch process platform concept |
| Technology Position | Upgrade and lifecycle extension | Configurable production platform | Design concept / 3D rendering |
| Development Status | Available / Upgrade Solution | Available | Conceptual Design |
Application Guide
Need compact legacy equipment upgrade?
Review Aibo I for selected legacy equipment modernization and lifecycle-extension projects.
Need 4-inch to 8-inch multi-application processing?
Review Aibo II for strip, de-scum, lite etch and plasma clean applications.
Need a 12-inch concept platform?
Review Aibo III as a conceptual platform direction for 12-inch dry asher projects.
Final platform selection depends on wafer size, process type, required capacity, chamber configuration and equipment integration needs.
Related Technology
Find the Right Aibo Platform
Provide wafer size, process application, required throughput and current equipment information for platform review.